Vertical furnaces are those furnaces where process tube is located vertically. The furnaces consist of boat and wafers that moves up and down. The vertical electric furnaces have certain advantages with respect to the horizontal furnaces in terms of the foot print in the clean room, compatibility with automated wafer loading, and heating uniformity. These furnaces are used for almost all thermal processes used in the semiconductor production technology like diffusion, oxidation, solar cell doping by phosphorus oxychloride etc.

Configuration
The vertical furnace consist of furnace section which is open at the lower end which allows a boat for supporting a semiconductor thereon to be introduced and removed through the lower open end with respect to the furnace section. The disclosing of vertical furnace is disclosed which effectively prevents a semiconductor from being polluted by dust in an operation space.

Features
Following are the features of the vertical furnace:

• Cost effective
• Available in different configurations and sizes
• Very high flexibility because of manual wafer loading they are highly flexible
• The furnaces are normally equipped with automatic System controller
• Automatic transfer of water
• The furnace are mounted with high performance heater.
• Easy maintenance
• Cooling is easy

Applications
Following are the applications of the vertical furnace

• Semiconductor
• Processing for oxidation
• CVD
• Diffusion
• Annealing